The company has developed unique methods, regarding the art and material science of silicon and other substrates combined with photoresists and etchants and the combination of ion beam, laser, x-ray synchrotron and ultraviolet techniques, to make nano-scale devices utilized in the semiconductor, medical, space and other nano-scale industries.

Norsam has developed techniques to create sub-20 nanometer circuitry/patterns to boost the performance and fabrication processes for the semiconductor and MEMS industries. Other projects include designing more efficient holes for inkjet printers, small holes in glass substrates, unique polishing techniques, zone plate masks for x-ray synchrotron beams and 20 nm grating devices.

Other services include maskless prototyping and production that is cost effective and highly accurate as well as nano and micro sensors, actuators, AFM tips, appatures, transducers and channels plus silicon, metal and oxide bondings.